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Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch-Mask Applications

2015

Article

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A parallel nanolithographic patterning method is presented that can be used to obtain arrays of multifunctional nanoparticles. These patterns can simply be converted into a variety of secondary nanopatterns that are useful for nanolithographic imprint, plasmonic, and etch-mask applications.

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Author(s): Jeong, Hyeon-Ho and Mark, Andrew G. and Lee, Tung-Chun and Son, Kwanghyo and Chen, Wenwen and Alarcon-Correa, Mariana and Kim, Insook and Schütz, Gisela and Fischer, Peer
Journal: Advanced Science
Volume: 2
Number (issue): 7
Pages: 1500016
Year: 2015

Department(s): Micro, Nano, and Molecular Systems
Bibtex Type: Article (article)

DOI: 10.1002/advs.201500016
State: Published
URL: http://dx.doi.org/10.1002/advs.201500016

BibTex

@article{ADVS:ADVS201500016,
  title = {Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch-Mask Applications},
  author = {Jeong, Hyeon-Ho and Mark, Andrew G. and Lee, Tung-Chun and Son, Kwanghyo and Chen, Wenwen and Alarcon-Correa, Mariana and Kim, Insook and Sch{\"u}tz, Gisela and Fischer, Peer},
  journal = {Advanced Science},
  volume = {2},
  number = {7},
  pages = {1500016},
  year = {2015},
  url = {http://dx.doi.org/10.1002/advs.201500016}
}