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Selectable nanopattern arrays for nanolithographic imprint and etch-mask applications

2015

Article

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Author(s): Jeong, H.-H. and Mark, A. G. and Lee, T.-C. and Son, K. and Chen, W. and Alarcón-Correa, M. and Kim, I. and Schütz, G. and Fischer, P.
Journal: {Advanced Science}
Volume: 2
Number (issue): 2
Year: 2015
Publisher: Wiley-VCH

Department(s): Modern Magnetic Systems
Bibtex Type: Article (article)

Address: Weinheim
DOI: 10.1002/advs.201500016
Language: eng

BibTex

@article{escidoc:0119,
  title = {{Selectable nanopattern arrays for nanolithographic imprint and etch-mask applications}},
  author = {Jeong, H.-H. and Mark, A. G. and Lee, T.-C. and Son, K. and Chen, W. and Alarc\'on-Correa, M. and Kim, I. and Sch\"utz, G. and Fischer, P.},
  journal = {{Advanced Science}},
  volume = {2},
  number = {2},
  publisher = {Wiley-VCH},
  address = {Weinheim},
  year = {2015}
}