Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch-Mask Applications
2015
Article
pf
A parallel nanolithographic patterning method is presented that can be used to obtain arrays of multifunctional nanoparticles. These patterns can simply be converted into a variety of secondary nanopatterns that are useful for nanolithographic imprint, plasmonic, and etch-mask applications.
| Author(s): | Jeong, H. H. and Mark, Andrew G. and Lee, Tung-Chun and Son, Kwanghyo and Chen, Wenwen and Alarcon-Correa, Mariana and Kim, Insook and Schütz, Gisela and Fischer, Peer |
| Journal: | Adv. Science |
| Volume: | 2 |
| Number (issue): | 7 |
| Pages: | 1500016 |
| Year: | 2015 |
| Department(s): | Micro, Nano, and Molecular Systems |
| Bibtex Type: | Article (article) |
| DOI: | 10.1002/advs.201500016 |
| Note: | Featured cover article. |
| State: | Published |
| URL: | http://dx.doi.org/10.1002/advs.201500016 |
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BibTex @article{2015jeong,
title = {Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch-Mask Applications},
author = {Jeong, H. H. and Mark, Andrew G. and Lee, Tung-Chun and Son, Kwanghyo and Chen, Wenwen and Alarcon-Correa, Mariana and Kim, Insook and Sch{\"u}tz, Gisela and Fischer, Peer},
journal = {Adv. Science},
volume = {2},
number = {7},
pages = {1500016},
year = {2015},
note = {Featured cover article.},
doi = {10.1002/advs.201500016},
url = {http://dx.doi.org/10.1002/advs.201500016}
}
|
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